Variation modeling for 20/22nm and smaller process technologies requires a high degree of accuracy due to the significant impact of OCV effects at these process nodes. Library teams have standardized on using the Liberty Variation Format (LVF) to specify OCV information for these process nodes. This article explains how to verify LVF data are correct for validating on-chip variation.

Read More

Find out how T&VS Verification services help to meet the challenging requirements with respect to performance, flexibility and verify today’s complex designs effectively.